Experimental demonstration of plasmonic quantum walks in the one-dimensional gold-strip waveguide lattice structure

2019.12.13

  Shuichiro Inoue, Nihon University

Quantum walks (QWs) simulate quantum mechanical behaviours of particles, which exhibit time evolutions completely different from the classical random walks. QWs offer quantum physical simulations and the novel approach to build quantum computers. Currently on-chip photonic devices have been intensively developed and QWs have been implemented using photonic circuits based on silica waveguide platforms.

We have experimentally demonstrated QWs in
one-dimensional lattice structures based on the long-range surface plasmon
polariton (LR-SPP) waveguide platform. The LR-SPP waveguide allows a
single-polarization mode, and has relatively low optical losses. The

Generation of high-repetition rate sub-cycle mid-infrared pulses applicable to lightwave-driven STM

2019.11.25

Yokohama National
University, Jun Takeda

Lightwave-driven
scanning tunneling microscopy (STM) has been realized using
carrier-envelope-phase (CEP)-stable THz pulses, and electron tunneling was
coherently manipulated across a tunnel junction.

Robust control of two-qubit Hamiltonian dynamics

2019.11.13

Mio Murao, The University of Tokyo

We showed that it is possible to achieve robust control of Hamiltonian dynamics to implement an arbitrary target quantum gate for two-qubit Hamiltonian systems including an unknown parameter by adding a single-qubit control Hamiltonian.

Hot topics

2019.10.11

Ritsumeikan University,Shinichiro Mouri

We have studied to
control valley-spin polarization of layered materials such as MoS2 using
polarization field (spontaneous polarization, piezo polarization) of
semiconductors in the publicly offered research.

Development of a fabrication instrument of high quality small tunnel junctions with the aid of room-temperature atomic layer deposition

2019.06.18

The University of Electro-Communications, Tokyo Hiroshi Shimada

For the fabrication of small tunnel junctions, the electron-beam lithography with bi-layer resists and angle evaporation are used as the standard method.